Thesis Seminar
Noyes 147 (J. Holmes Sturdivant Lecture Hall)
Development of Fluoropolymer Resists for 157 nm Lithography
Daniel P. Sanders,
Graduate Student,
Department of Chemistry, Caltech,
"Development of Fluoropolymer Resists for 157 nm Lithography," Daniel Sanders, graduate student in chemistry, Caltech.
For more information, please contact Dian Buchness by phone at x6110 or by email at [email protected].
Event Series
Thesis Seminar